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SPIE AL 2017 : SPIE Advanced Lithography 2017


When Feb 26, 2017 - Mar 1, 2017
Where San Jose Marriott
Submission Deadline Sep 6, 2016
Notification Due Sep 6, 2016
Final Version Due Sep 6, 2016
Categories    advanced lithography   engineering   physics   integrated circuits

Call For Papers

SPIE Advanced Lithography is the premier conference for the lithography community. For over 40 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.
SPIE Advanced Lithography draws more than 2,100 attendees, 55 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Extreme Ultraviolet (EUV) Lithography
+ Emerging Patterning Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Patterning Materials and Processes
+ Optical Microlithography
+ Design-Process-Technology Co-optimization for Manufacturability
+ Advanced Etch Technology for Nanopatterning

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