MNC 2008 SCOPE and SYMPOSIUM
1-1:DUV, VUV, EUV Lithography and Metrology
1-2:Electron- and Ion-Beam Lithography
1-3:Resist Materials and Processing
2-1:Nanodevices
2-2:Nanofabrication
2-3:Nanomaterials
2-4:Nano-Tool
3:Nanoimprint, Nanoprint and Rising Lithography
4:Bio MEMS, Lab on a Chip
5:Microsystem Technology and MEMS

Symposium A. Lithography Technology for 32nm node device
Symposium B. Sensor Applications of Micro- process and Nanotechnology
Symposium C. Nanoimprint Technology

Conference Site:
JAL Resort Sea Hawk Hotel Fukuoka, Japan

IMPORTANT DATE

Abstract Deadline:
June 30, 2008

Late News Paper :
September 1, 2008

Registration:
October , 2008

JJAP Proceeding
October 30, 2008