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SPIE AL 2025 : SPIE Advanced Lithography + Patterning 2025


When Feb 23, 2025 - Feb 27, 2025
Where San Jose, CA
Abstract Registration Due Aug 14, 2024
Submission Deadline Feb 15, 2025
Categories    lithography   nanolithography   optics   engineering

Call For Papers

SPIE Advanced Lithography + Patterning is the leading global lithography event. Attend the meeting for optical lithography, metrology, or EUV. Hear the latest advancements where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.
SPIE Advanced Lithography + Patterning draws more than 2,200 attendees, 50 exhibitors, and 500 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:

• Optical and EUV Nanolithography
• DTCO and Computational Patterning
• Metrology, Inspection, and Process Control
• Novel Patterning Technologies
• Advances in Patterning Materials and Processes
• Advanced Etch Technology and Process Integration for Nanopatterning

Exhibition: Advanced Lithography + Patterning Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.

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