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SPIE AL 2022 : SPIE Advanced Lithography + Patterning 2022

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Link: https://SPIE.org/al_wcsfp
 
When Feb 27, 2022 - Mar 3, 2022
Where San Jose/California
Submission Deadline Sep 1, 2021
Notification Due Dec 6, 2021
Final Version Due Jan 21, 2022
Categories    engineering   lithography   computational patterns   euv and euvl
 

Call For Papers

SPIE Advanced Lithography + Patterning is the leading global lithography event. Attend the meeting for optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Hear the latest advancements where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.
SPIE Advanced Lithography + Patterning draws more than 2,000 attendees, 50 exhibitors, and 500 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Optical and Extreme Ultraviolet (EUV) Nanolithography
+ DTCO and Computational Patterning
+ Metrology, Inspection, and Process Control
+ Novel Patterning Technologies
+ Advances in Patterning Materials and Processes
+ Advanced Etch Technology and Process Integration for Nanopatterning

Exhibition: Advanced Lithography + Patterning Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.

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